Channel: Applied Science

Category: Science & Technology

Description: An explanation and demo of atomic layer deposition (ALD) of copper metal on glass. Precursors are copper(I) chloride and hydrogen, processed in a hot-wall tube quartz tube furnace. 10 torr operating pressure 500 sccm argon sweep/purge gas constantly flowing 75 sccm CuCl argon pulse gas (17 seconds including flow controller lag) 100 sccm H pulse gas (14 seconds including flow controller lag) 7 second purge time between pulses 100mm quartz tube furnace diameter 415*C deposition temperature 350*C CuCl evaporation temperature Substrates are mostly borosilicate glass cleaned with RCA clean The "good" samples shown in the video are about 750 cycles (about 9 hours Main ref: sci-hub.se/https://doi.org/10.1002/cvde.19970030107 Also helpful: sci-hub.se/https://doi.org/10.1063/1.5087759 sci-hub.se/10.1149/2.0261501jss sci-hub.se/https://doi.org/10.1016/0022-0248(92)90191-K Alicat flow controller manuals (hard to find via website navigation): documents.alicat.com/manuals/DOC-MANUAL-MC.pdf documents.alicat.com/manuals/old/Gas_Flow_Controller_Manual_rev7.pdf documents.alicat.com/Alicat-Serial-Primer.pdf RCA clean: en.wikipedia.org/wiki/RCA_clean CuCl synthesis: wwwchem.uwimona.edu.jm/lab_manuals/c1901exp35.html Support Applied Science on Patreon: patreon.com/AppliedScience